JONES, D. C. .; YOUNG, J. M. .; LAKSHANTHA, W. J. .; SINGH, S. .; BYERS, T. A. .; WEATHERS, D. L. .; MCDANIEL, F. D. .; ROUT, B. . Redistribution of Nickel Ions Embedded within Indium Phosphide Via Low Energy Dual Ion Implantations. Journal of Nuclear Physics, Material Sciences, Radiation and Applications, [S. l.], v. 6, n. 1, p. 9–15, 2018. DOI: 10.15415/jnp.2018.61002. Disponível em: https://jnp.chitkara.edu.in/index.php/jnp/article/view/27. Acesso em: 29 mar. 2024.